Silicon dioxide films
Silicon dioxide films offer a TEM support membrane of exceptional flatness combined with a thickness of 40nm, 18nm or 8nm.
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Silicon dioxide films offer a TEM support membrane of exceptional flatness combined with a thickness of 40nm, 18nm or 8nm.
The membrane window area (0.5 x 0.5mm) is patterned into 24 apertures of:
- 50 x 50µm for the 40nm films (AGS167)
- 60 x 60µm for the 18nm films (AGS167U)
- 70 x 70µm for the 8nm films (AGS167T)
The bar size between the SiO2 apertures is 30µm and the boundary width is 65µm. The silicon dioxide films are supported on a 200µm silicon support structure which fits into all standard TEM holders. Silicon dioxide support films have excellent chemical, physical and thermal stability. They can be used for nanomaterial deposition and growth, thin film analysis and characterisation, catalyst research and development, supporting FIB lamellae, characterisation of semiconductor materials and imaging of biological materials.
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